The analysts forecast global epitaxy deposition market to grow at a CAGR of 11.54% during the period 2016-2020. Epitaxy is a method used to lay or grow a single crystalline film or layer over a crystalline-based semiconductor substrate or surface. The deposited substance must have a definite acclimatization with regard to the crystal-based semiconductor substrate. Chip manufacturers use either vapor- or molten-based foundations to develop such epitaxial overlayers.
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The two methods that used for epitaxial deposition are homoepitaxy and heteroepitaxy. Homoepitaxy deposition is a method of laying a film or layer on a surface or substrate of a similar level of conformation.
Heteroepitaxy is a deposition method by which a film or layer is deposited on a substrate of dissimilar composition.
This report covers the present scenario and the growth prospects of the global epitaxy deposition market for the period 2016-2020.
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The market is divided into the following segments based on geography:
Global Epitaxy Deposition Market 2016-2020, has been prepared based on an in-depth market analysis with inputs from industry experts. This report covers the market landscape and its growth prospects over the coming years.
The report also includes a discussion of the key vendors operating in this market.
Key vendors: Applied Materials, Inc.,ASM International,Hitachi Kokusai Electric Inc.,LAM RESEARCH CORPORATION and Tokyo Electron Limited.
Other prominent vendors: AIXTRON,Canon Anelva Corporation,IQE and Veeco Instruments.
Market driver: Increasing demand for high-performance semiconductor devices and for a full, detailed list, view our report.
Market challenge: Requirement for thorough inspection of epitaxial film surface and for a full, detailed list, view our report.
Market trend: Increasing number of M&A and fabless semiconductor companies and for a full, detailed list, view our report.
Table of Contents
Scope of the report
Market Research Methodology
Market segmentation by application
Key leading countries
Impact of drivers
Impact of drivers and challenges
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