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Global Plasma Etch System market set to grow according to forecasts

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Global Plasma Etch System Market offers a wide range of market dynamics like current trends (2019), estimated forecast (2025), segmentation by types, applications and by companies. It also includes key companies profile and talks about their market share.

This report studies the Plasma Etch System market. Plasma Etching System is a series of devices and equipment used together to perform plasma etching.

Plasma etching is a form of plasma processing used to fabricate integrated circuits. It involves a high-speed stream of glow discharge (plasma) of an appropriate gas mixture being shot (in pulses) at a sample.

The plasma source, known as. species, can be either charged (ions) or neutral (atoms and radicals). During the process, the plasma generates volatile. products at room temperature from the chemical reactions between the elements of the material etched and the reactive species generated by the plasma.

Eventually the atoms of the shot element embed themselves at or just below the surface of the target, thus modifying the physical properties of the target.

North America ranks the top in terms of global market size of Plasma Etch System, it consists of 48.57% of the international market in 2016. Japan comes the second, with 20.03% of the global market.

Europe consists of 12.51% of the Plasma Etch System market in the same year, the other regions all together consist of 8.81%.

Applied Materials, Inc. ranks the first in terms of revenue share in Global market of Plasma Etch System, occupies 24.12% of market share in 2016; While, Lam Research, with a market share of 22.89%, comes the second; Tokyo Electron Limited, with a market share of 17.36% in 2016, comes the third. All the other manufacturers which are not included in the report together consist of approximately 27.02% of the global market in 2016.

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The global Plasma Etch System market is valued at 3910 million US$ in 2018 is expected to reach 9690 million US$ by the end of 2025, growing at a CAGR of 12.0% during 2019-2025.

This report focuses on Plasma Etch System volume and value at global level, regional level and company level. From a global perspective, this report represents overall Plasma Etch System market size by analyzing historical data and future prospect.

Regionally, this report focuses on several key regions: North America, Europe, China and Japan. Key companies profiled on his report are Oxford Instruments, ULVAC, Lam Research, AMEC, PlasmaTherm, SAMCO Inc., Applied Materials, Inc., Sentech, SPTS Technologies (an Orbotech Company), GigaLane, CORIAL, Trion Technology, NAURA, Plasma Etch, Inc., Tokyo Electron Limited and more in the terms of Product Introduction, Application, Specification, companies Production, Revenue, Price and Gross Margin (2014-2019),.

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Segment by Regions

  • North America
  • Europe
  • China
  • Japan

Segment by Type

  • Inductively Coupled Plasma (ICP)
  • Reactive Ion Etching (RIE)
  • Deep Reactive Ion Etching (DRIE)
  • Others

Segment by Application

  • Semiconductor Industry
  • Medical Industry
  • Electronics & Microelectronics
  • Others

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