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Global atomic layer deposition equipment market report detailed in new research

Global atomic layer deposition equipment market report detailed in new research

The global atomic layer deposition equipment market is categorized into type and application. Under type segment, the market is further bifurcated into Metal ALD, Aluminum Oxide ALD, Catalytic ALD, ALD on Polymers, and others. The Aluminum Oxide ALD segment was followed by the metal ALD segment and accounted for the largest market share in 2016 owing to its extensive usage in various applications such as solar cell surface passivation, dielectric layers, insulating layers and others.

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Global Atomic Layer Deposition Equipment Market Report by Variant Market Research, estimate that global market is projected to reach $8,059 Million by 2024, from $1,041 Million in 2016. The report will include detailed analysis of atomic layer deposition equipment market with respect to major segments such as types, application, and geography.

Atomic layer deposition (ALD) is a technique used to deposit thin films. This technique is used in advanced applications such as, microelectronics and nanotechnology.

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They have the ability to provide pin hole free, uniform and conformal films film on a wide range of substrates.

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Increasing applications of ALD drives the market

The factors boosting the growth of the market include, increasing adoption of ALD in medical & aerospace electronics, growing demand for copper deposition equipment in memory devices, and spurge in the use of ALD in various applications. As they provide a very precise method to deposit thin film, they are highly used in Bio MEMS, nano-electronic applications, organic semiconductors, and others.

Additionally, advancements in ALD and introduction of ALD in energy storage systems, and power devices would provide several opportunities in the forecast years. Though, high initial investments and lack of professionals may hamper the market growth.

Thin field technique is a rapidly developing field and have proved to be an effective technique in areas of optics, magnetic recording heads, and protective coatings.

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Market Segmentation

Type, application, and geography are the three major segments considered in the global atomic layer deposition equipment market. By type, the market is bifurcated into Metal ALD, Aluminum Oxide ALD, Catalytic ALD, ALD on Polymers, and others.

Applications segment is further bifurcated into semiconductor & electronics, and research & development facilities. Based on geography, the global ALD equipment market has been segmented into North America, Europe, Asia-Pacific, and RoW.

Aluminum Oxide ALD dominated the type segment

Atomic layer deposition of aluminum oxide is one of the most commonly preferred technique. Aluminum oxide is favored as an alternative to other oxide and nitride systems, as they are capable of providing thicker dielectric that will reduce leakage and improve gate capacitance.

It’s the most stable and robust material that are suitable for microelectronics.

Semiconductors & electronics led the largest market share in the application segment

Atomic layer deposition is widely used in semiconductor industry for fabrication of variety of devices and components. Growing demand for miniaturization and integration have led to increased use of ALD, owing to its ability to form homogenous, uniform, and dense films.

Moreover, several semiconductor and electronics company are depending on R&D initiatives in ALD for manufacturing advanced semiconductors and electronic devices.

Asia-Pacific dominated the geography segment

Asia-Pacific region accounted for the largest market share and also is anticipated to attain the fastest CAGR, driven by, presence of major companies in countries like China, North Korea, and India. Moreover, rapid expansion of industries, growing economic stability, escalating sales of ALD equipment, and favorable government policies also supports the overall growth of atomic layer deposition market in this region.

Competitive Landscape

The major companies operating in the ALD equipment market are Aixtron SE, Hitachi Kokusai Electric Inc., ASM International N.V., Tokyo Electron Ltd., Ultratech Inc., Adeka Corp, Applied Materials Inc., ATMI Incorporated., and Lam Research Corporation, among others.

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Scope of Atomic Layer Deposition Equipment Market

Type Segments

  • Metal ALD
  • Aluminum Oxide ALD
  • ALD on Polymers
  • Catalytic ALD
  • Others

Application Segments

  • Research & Development Facilities
  • Semiconductor & Electronics

Geographical Segments

  • North America
  • US
  • Canada
  • Mexico
  • Europe
  • UK
  • Italy
  • France
  • Germany
  • Others
  • Asia-Pacific
  • China
  • India
  • Japan
  • Taiwan
  • South Korea
  • Others
  • RoW
  • South America
  • Middle East
  • Africa

News From

Variant Market ResearchVariant Market Research
Category: Market Research Publishers and RetailersCompany profile: Variant Market Research offers syndicated and customized report to fulfill client’s objective. We also provide customized data pack proposing market sizing in an Excel/PDF/Power point or Word format as per the requirement of clients. We cover several industry domains namely- Semiconductor & Electronics, Consumer Electronics, Information and Communication Technology, Automotive, Consumer Goods, Food & Beverages, Pharmaceuticals, Medical Devices, Chemicals, Industrial, Mining Equipmen ...